Semiconductor device

摘要

A mask includes a substrate, an effective pixel formation region and a reference pattern formation region. A pixel pattern for forming a pixel component that constitutes a pixel is arranged in the effective pixel formation region. A reference pattern for indicating a reference position where pixel pattern should be arranged in the effective pixel formation region is arranged in the reference pattern formation region. Pixel pattern is arranged to be displaced from the reference position toward a center side of the effective pixel formation region.

主权项

1. A semiconductor device, comprising:
a semiconductor substrate having a main surface; an effective pixel region arranged on said main surface of said semiconductor substrate; and a reference portion arrangement region surrounding said effective pixel region on said main surface, wherein a light blocking film that constitutes a pixel is arranged in said effective pixel region, a reference portion for indicating a reference position where said light blocking film should be arranged in said effective pixel region is arranged in said reference portion arrangement region, and said light blocking film is arranged to be displaced from said reference position toward a center side of said effective pixel region, wherein the light blocking film is formed in a first layer and the reference portion is formed in a second layer.