| 摘要 |
A photothermographic element having a strippably-adhered, radiation-absorbing, antihalation layer is disclosed. The element comprises at least one imageable layer adhered to one surface of a support base, and an antihalation layer having a resistance greater than 1500 ohms per square, strippably adhered to any exposed surface of said element, said antihalation layer having a delaminating resistance in the range of 6 to 50 g/cm, a layer strength in g/cm greater than its delaminating resistance, and an optical density of at least 0.1. |
