| 摘要 |
<p>PURPOSE: To provide a high speed heat treatment equipment which eliminates the shadow of light irradiation which is caused by a holding jig, improve in- surface temperature uniformity, and can form a film excellent in uniformity. CONSTITUTION: In a high speed heat treatment equipment which heat-treats a treatment substrate in a chamber by using infrared lamps, the following are installed; a substrate holding member 4 which retains a treatment substrate 1, in the lower end portion, directly or via a substrate holder, a rotary shaft 30 formed in the upper end central part of the substrate holding member, infrared lamps 12 arranged on the outer part of a chamber lower end portion, and a means which makes the rotary shaft rotatable.</p> |
