发明名称 PHOTOPOLYMERIZING COMPOSITION AND PHOTOPOLYMERIZING PUTTY COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photopolymerizing composition which has an excellent speed for photosensitivity to active rays, especially to visible rays and brings about no dark reaction; and a photopolymerizing putty composition. SOLUTION: The photopolymerizing composition comprises (a) a titanocene derivative, (b) a compound having a protogenic group, and (c) a compound having at least one ethylenic unsaturated double bond, wherein (b) and (c) have a weight ratio of 0.01:99.99-20:80 and (a) the titanocene derivative has 0.01-10 parts by weight relative to 100 parts by weight of the sum of (b) and (c). The photopolymerizing putty composition comprises further (d) a filler.
申请公布号 JP2001316416(A) 申请公布日期 2001.11.13
申请号 JP20000136582 申请日期 2000.05.10
申请人 NIPPON PAINT CO LTD 发明人 SETA TSUTOMU;KAWABATA MASAMI
分类号 C08K3/00;C08F2/44;C08F2/46;C08F4/647;C08F20/02;C08F26/02;C08F290/04;C08F291/00;C08F299/02;C08L21/00;C08L23/06;C08L33/00;C08L55/00;C09D4/00;C09D5/34;C09D143/00;C09D157/00;(IPC1-7):C08F4/647 主分类号 C08K3/00
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