发明名称 PHOTODETECTING SENSOR AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a photodetecting sensor wherein each light receiving element can be operated independently by using a new constitution. SOLUTION: In a light receiving element forming island of a sensor chip 3, P regions 12, 14 of photodiodes DR, DCI are formed on a surface layer part of an N-type epitaxial layer 15b, and the P regions 12, 14 are in contact with electrodes 27, 28. A deep N+ region 30 is formed on the N-type epitaxial layer 15b between the adjacent P regions 12, 14 and reaches a buried N+ region 20. Carriers which are generated by light irradiation from the photodiodes DR, DCI are trapped by the deep N+ region 20. On a silicon substrate 15, an aluminum film 42a as a light shielding film is arranged between forming regions of the photodiodes DR, DCI.
申请公布号 JP2002057312(A) 申请公布日期 2002.02.22
申请号 JP20000239858 申请日期 2000.08.08
申请人 DENSO CORP 发明人 TOYODA INEO
分类号 G01J1/02;H01L27/14;H01L27/144;H01L27/146;H01L31/10;(IPC1-7):H01L27/146 主分类号 G01J1/02
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