发明名称 DEFECT DETECTING METHOD, DEFECT OBSERVING METHOD AND DEFECT DETECTING APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To provide a highly sensitive inspection technology that can prevent detection of misinformation. SOLUTION: This defect detecting method has a means to detect an image of a whole chip, and, an inspection region of this image is divided into a plurality of regions based on sensitivity to fatal defects so that inspection sensitivity can be set up in each region. Or by recording a characteristic amount to judge a defect in an inspection result, for example a shading difference, misinformation can be removed in a post handling after the inspection. Moreover, by configuring a sharing system of inspecting conditions and others necessary in common among a group of inspection apparatuses, it becomes possible to reduce the time finding out an inspecting condition and monitor stability and reliability.</p>
申请公布号 JP2002100660(A) 申请公布日期 2002.04.05
申请号 JP20010103290 申请日期 2001.04.02
申请人 HITACHI LTD 发明人 SHIBATA YUKIHIRO;MAEDA SHUNJI;KENBO YUKIO
分类号 G01B11/30;G01N21/95;G01N21/956;G01N23/205;H01L21/66;(IPC1-7):H01L21/66 主分类号 G01B11/30
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