发明名称 COLOR IMAGE SENSOR AND FABRICATING METHOD THEREOF
摘要 PURPOSE: A color image sensor is provided to reduce density of pigment and a light scattering effect, by making color filter array materials contain corresponding pure color pigment and by using an over coating material layer including a desired color pigment instead of a transparent over coating material. CONSTITUTION: A substrate is of an arbitrary topology. The over coating material layer is formed on the substrate to planarize the topology of the substrate, containing the first color pigment. At least one of the first color filter is formed on the over coating material layer, containing only the second color pigment. At least one of the second color filter is formed on the over coating material layer, adjacent to the first color filter and containing only the third color pigment. The third color filter is formed on the over coating material layer, adjacent to the first and second color filters and containing only the fourth color pigment.
申请公布号 KR20020039125(A) 申请公布日期 2002.05.25
申请号 KR20000069034 申请日期 2000.11.20
申请人 HYNIX SEMICONDUCTOR INC. 发明人 SHIN, DAE UNG
分类号 H01L27/146;(IPC1-7):H01L27/146 主分类号 H01L27/146
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