APPARATUS FOR ELIMINATING RESIDUAL BEAM OF APPARATUS FOR INSPECTING SURFACE OF WAFER

摘要

PURPOSE: An apparatus for eliminating residual beam of an apparatus for inspecting the surface of a wafer is provided to precisely inspect contamination particles attached to the surface of the semiconductor wafer, by eliminating scattering and interference of the residual beam generated when a reflecting beam collides against the inner sidewall of a housing. CONSTITUTION: A wafer chuck(12) is transferred in the X-Y direction inside the housing while being rotated in a predetermined direction. A laser module generates a beam having a predetermined wavelength to the surface of the semiconductor wafer and makes the beam incident at a predetermined angle with the surface of the semiconductor wafer so that the image of the semiconductor wafer settled in the wafer chuck is focused on an optical detecting module. The second reflecting mirror(21) receives a front reflecting beam of the beam incident upon the surface of the semiconductor wafer such that the beam is generated from the laser module, and refracts the front reflecting beam at a predetermined angle. A dump(22) absorbs the incident reflecting beam refracted from the second reflecting mirror.