发明名称 POLISHING COMPOSITIONS
摘要 This is a new wax composition which has a good effect on cleaning, removal of scratch, polishing, coating and anticorrosion at a single usage. The wax comprises water 100 pt., abrasive compd. 10-5 pt., oleic acid 0.5-5 pt., paraffin wax 4-10 pt., surfactant 10-25 pt., oil type silicone 5-15 pt. and some thickner.
申请公布号 KR940007317(B1) 申请公布日期 1994.08.13
申请号 KR19910009392 申请日期 1990.06.07
申请人 PARK, JONG - SUNG 发明人 PARK, JONG - SUNG
分类号 C09G1/02;C09G1/12;(IPC1-7):C09G1/12 主分类号 C09G1/02
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