TECNICA DI FOTOLITOGRAFIA IN SITU DI STRATI SOTTILI DI MATERIALI SUPERCONDUTTORI AD ALTA TEMPERATURA CRITICA,申请号IT1994RM00643-传众专利搜索

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发明名称	TECNICA DI FOTOLITOGRAFIA IN SITU DI STRATI SOTTILI DI MATERIALI SUPERCONDUTTORI AD ALTA TEMPERATURA CRITICA
摘要
申请公布号	ITRM940643(A1)	申请公布日期	1996.04.08
申请号	IT1994RM00643	申请日期	1994.10.07
申请人	CONSIGLIO NAZIONALE DELLE RICERCHE	发明人	ATTANASIO CARMINE;COCCORESE CORRADO;MARITATO LUIGI;PRISCHEPA SERGHEJ
分类号	H01B	主分类号	H01B
代理机构		代理人
主权项
地址

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