发明名称 ANTISTATIC FILM AND METHOD OF MANUFACTURING THE SAME
摘要 <p>An antistatic film comprising a chemically adsorbed film of straight chain molecules each containing a conductive group and provided on a chargeable substrate via covalent bonds each containing a Si group, said chemically adsorbed film having a conductivity of 10&lt;-&gt;&lt;1&gt;&lt;0&gt; S/cm or above. With the antistatic chemically adsorbed film according to the invention, conductive functional groups are secured via chemically adsorbed molecules and by siloxane bonds to the surface of a substrate material such as ceramics, glass, synthetic resins or synthetic fibers, a film, a plate, an display screen surface, a light-emitting tube. Thus, the film provides an antistatic effect and does not separate. In addition, this chemically adsorbed film has a thickness at the nanometer level and is thus excellently transparent, as well as capable of preventing contamination of the substrate surface due to charging thereof. The film is also excellently durable. Further, when a chemically adsorbed polymer film is formed, a high molecular density, chemically adsorbed film can be obtained.</p>
申请公布号 KR970003855(B1) 申请公布日期 1997.03.22
申请号 KR19920007353 申请日期 1992.04.30
申请人 MATSUSHITA ELECTRIC IND.KK. 发明人 OGAWA, KAZUFUMI;MINO, NORIHISA;SOGA, MAMORU
分类号 B05D1/18;C03C17/30;C03C17/42;C09D4/00;C09D5/24;C09K3/16;(IPC1-7):B01J20/26 主分类号 B05D1/18
代理机构 代理人
主权项
地址