VACUUM PLASMA PROCESSING APPARATUS AND METHOD,申请号KR19950002639-传众专利搜索

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发明名称	VACUUM PLASMA PROCESSING APPARATUS AND METHOD
摘要
申请公布号	KR0148086(B1)	申请公布日期	1998.11.02
申请号	KR19950002639	申请日期	1995.02.14
申请人	MATSUSHITA ELECTRIC IND. CO.,LTD	发明人	WATANABE, SYOUZOU;SUZUKI, MASAKI;NAKAYAMA, ICHIRO;OKUMURA, TOMOHIRO
分类号	H05H1/16;C23C14/40;C23C16/509;C23F4/04;H01J37/32;H01L21/203;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):H01L21/302	主分类号	H05H1/16
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