发明名称 POSITION DETECTION APPARATUS AND METHOD, ELECTRONIC COMPONENT CONVEYANCE APPARATUS, AND ELECTRON BEAM EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To accurately detect the position of a mark from an input image, by minimizing the effects due to change in the luminance distribution of the input image, and deformation of the mark. SOLUTION: The position detection apparatus for detecting the position of a mark that approximates a template image has a calculation processing section 30. The calculation processing section 30 has a phase difference calculating means 42 for calculating the phase constituent difference between a phase constituent, when the template image is converted to a frequency constituent with a specific position in the template image as a reference, and that when the input image is converted to the frequency constituent with a specific position in the input image as the reference for each frequency, and a mark position detection means 50 for detecting the position of the mark in the input image, based on a phase impulse response function, where the phase constituent difference calculated by the phase difference calculation means 42 is converted.
申请公布号 JP2002353126(A) 申请公布日期 2002.12.06
申请号 JP20010161328 申请日期 2001.05.29
申请人 ADVANTEST CORP 发明人 YAMAGUCHI TAKAHIRO;ICHIKAWA MASAMICHI
分类号 G01B11/00;G03F7/20;G03F9/00;H01J37/304;H01L21/027;(IPC1-7):H01L21/027 主分类号 G01B11/00
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