发明名称 Defect inspection method and defect inspection apparatus
摘要 A defect inspection apparatus for inspecting a presence of a defect on an object includes: a first input unit which inputs wavelength characteristics of each of a plurality of samples with wavelength variation of an illumination light for inspection; a second input unit which inputs inspection conditions which an inspector sets for each of the samples as a teaching signal; a third input unit which inputs a wavelength characteristic of the object with the wavelength variation of the illumination light; a neural network which learns and stores a relationship between the inputted wavelength characteristic of each sample and the inputted inspection condition for each sample, and determines an inspection condition for the object based on the inputted wavelength characteristic of the object and the learned relationship; and a defect detector which detects a defect of the object based on the determined inspection condition of the object.
申请公布号 US6556291(B2) 申请公布日期 2003.04.29
申请号 US20010867600 申请日期 2001.05.31
申请人 NIDEK CO., LTD. 发明人 YONEZAWA EIJI
分类号 G01N21/956;G01N21/25;G01N21/88;(IPC1-7):G01N21/00 主分类号 G01N21/956
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