| 摘要 |
PURPOSE: A device for cleaning a photomask and a method for removing a defective condition of a photomask are provided to improve the operation of the exposure apparatus and to save the time needed to remove defects. CONSTITUTION: The device for cleaning a photomask comprises a gas providing part(10), a pressurizing pump(20) for the gas provided by the gas providing part(10), an ionizer(30) through which the gas discharged from the pump(20) is passed and a jet(40) for ejecting the gas discharged from the ionizer(30) to the mask. The method for removing a defective condition of a photomask comprises the steps of: unloading and conveying the mask from the mask cassette, ejecting the pressurized gas passed through the ionizer toward the mask to clean it, exposing with the mask cleaned by the preceding step, checking the exposed condition to judge whether a defect is present or not, and removing the defective condition by loading on a mask checking zone if a defect is present in the mask. |
