发明名称 Method of copper/copper surface bonding using a conducting polymer for application in IC chip bonding
摘要 A semiconductor chip having an exposed metal terminating pad thereover, and a separate substrate having a corresponding exposed metal bump thereover are provided. A conducting polymer plug is formed over the exposed metal terminating pad. A conforming interface layer is formed over the conducting polymer plug. The conducting polymer plug of the semiconductor chip is aligned with the corresponding metal bump. The conforming interface layer over the conducting polymer plug is mated with the corresponding metal bump. The conforming interface layer is thermally decomposed, adhering and permanently attaching the conducting polymer plug with the corresponding metal bump. Methods of forming and patterning a nickel carbonyl layer are also disclosed.
申请公布号 US6821888(B2) 申请公布日期 2004.11.23
申请号 US20020076244 申请日期 2002.02.13
申请人 CHARTERED SEMICONDUCTOR MANUFACTURING LTD. 发明人 ALIYU YAKUB;CHOOI SIMON;ZHOU MEISHENG;SUDIJONO JOHN;GUPTA SUBHASH;ROY SUDIPTO RANENDRA
分类号 H01L21/44;H01L21/50;H01L21/60;H01L23/48;H01L23/485;H01L23/52;H01L29/40;(IPC1-7):H01L21/44 主分类号 H01L21/44
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