发明名称 |
PROCEDE ET INSTALLATION DE TRANSFERT SANS CONTAMINATION. |
摘要 |
<p>A clean transfer method capable of safely transferring a semiconductor or the like to various apparatus for treating the semiconductor while keeping the environment clean. In the method, the semiconductor is transferred between a vacuum clean box arranged in a clean room and kept at the degree of vacuum of 1 Torr or less and a vacuum chamber arranged in a maintenance room while transfer ports of the vacuum clean box and vacuum chamber are kept air-tightly connected to each other. The vacuum clean box is movably arranged.</p> |
申请公布号 |
FR2668301(B1) |
申请公布日期 |
1995.02.17 |
申请号 |
FR19910006177 |
申请日期 |
1991.05.22 |
申请人 |
TDK CORP |
发明人 |
TETSUO TAKAHASHI;EISAKU MIYAUCHI;TOSHIHIKO MIYAJIMA |
分类号 |
B65D6/40;B65G49/00;B65G49/07;C23C14/56;H01L21/00;H01L21/677;(IPC1-7):H01L21/68;B23Q7/00 |
主分类号 |
B65D6/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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