发明名称 PROCEDE ET INSTALLATION DE TRANSFERT SANS CONTAMINATION.
摘要 <p>A clean transfer method capable of safely transferring a semiconductor or the like to various apparatus for treating the semiconductor while keeping the environment clean. In the method, the semiconductor is transferred between a vacuum clean box arranged in a clean room and kept at the degree of vacuum of 1 Torr or less and a vacuum chamber arranged in a maintenance room while transfer ports of the vacuum clean box and vacuum chamber are kept air-tightly connected to each other. The vacuum clean box is movably arranged.</p>
申请公布号 FR2668301(B1) 申请公布日期 1995.02.17
申请号 FR19910006177 申请日期 1991.05.22
申请人 TDK CORP 发明人 TETSUO TAKAHASHI;EISAKU MIYAUCHI;TOSHIHIKO MIYAJIMA
分类号 B65D6/40;B65G49/00;B65G49/07;C23C14/56;H01L21/00;H01L21/677;(IPC1-7):H01L21/68;B23Q7/00 主分类号 B65D6/40
代理机构 代理人
主权项
地址