| 摘要 |
PROBLEM TO BE SOLVED: To allow magnetic grains constituting a magnetic film to exist isolatedly, to reduce magnetic interaction between the magnetic grains and to obtain a stable structure and magnetic characteristics not affected by a process change by allowing a resin to exist on the grain boundaries of the magnetic grains. SOLUTION: At least one resin selected from polyisoquinoline, a UV-curing resin, epoxy resin, polymethyl methacrylate and polycarbonate is preferably used as a resin to be allowed to exist on the grain boundaries of magnetic grains constituting a magnetic film. In order to allow the resin to exist on the grain boundaries of the magnetic grains, the magnetic film is preferably formed by sputtering, in particular co-sputtering. The magnetic grains can be allowed to exist isolatedly.
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