| 摘要 |
PURPOSE: An evaporation deposition apparatus and method are provided to minimize uneven deposition due to the variation of distance between a substrate and a crucible module by changing the propagating direction of deposition materials moved toward the substrate, thereby improving uniformity of a thin film. CONSTITUTION: An evaporation deposition apparatus(100) comprises a chamber(110) having a deposition space, a substrate supporting module(120) which is installed in the chamber and supports a substrate(S), a crucible module(130) which is installed opposite to the substrate supporting module in the chamber and vaporizes deposition materials toward the substrate, and a direction change module(140) changing the propagating direction of the deposition materials evaporated toward the substrate.
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