发明名称 BURN-IN SYSTEM
摘要 PROBLEM TO BE SOLVED: To obtain a burn-in system which can boost signal frequency, when burn-in is performed on wafer state. SOLUTION: A wafer 116 as a DUT is heated to 125 deg.C by a heater 118 via wafer tray 117. A contactor 114 keeps connection with the wafer 116 and sends a signal from a burn-in substrate 112 to the wafer 116 through a flexible cable 115. At this time, the contactor 114 is heated, but this flexible cable 115 and a heat insulator 113 blocks heat conduction to the burn-in substrate 112. A driver substrate 119, which is kept nearly at room temperature, is positioned near the burn-in substrate 112. A driver 120, mounted on the driver substrate 119, sends a signal to the wafer 116 through a connector 121, the burn-in substrate 112, and the flexible cable 115 by the shortest distance.
申请公布号 JP2001023992(A) 申请公布日期 2001.01.26
申请号 JP19990194917 申请日期 1999.07.08
申请人 MATSUSHITA ELECTRIC IND CO LTD;ORION MACH CO LTD 发明人 ISHIZAKA MASAAKI
分类号 H01L21/324;G01R31/26;G01R31/28;H01L21/326;H01L21/66;(IPC1-7):H01L21/324 主分类号 H01L21/324
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