发明名称 SUBSTRATE PROCESSING DEVICE, AND SUBSTRATE PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a technology capable of preventing a device from increasing the size thereof and a manufacturing cost from increasing, when detecting foreign matters contained in a fluid circulating in each supply passage in a substrate processing device including the supply passage of the fluid.SOLUTION: This substrate processing device is structured so as to include fluid passage parts for measurement, each of which is a part of each of a plurality of supply passages for a fluid supplied to a substrate, which forms a measurement region for foreign matters in the fluid, and which are provided while mutually forming a row, a light irradiation part shared by a plurality of the fluid passage parts to form an optical path in the fluid passage part, a movement mechanism for relatively moving the light irradiation part along the arrangement direction of the fluid passage parts in order to form the optical path in the selected fluid passage part among a plurality of the fluid passage parts, a light receiving part including a light receiving element for receiving light permeating the fluid passage part, and a detection part for detecting the foreign matters in the fluid based on a signal output from the light receiving element. Thereby, the number of the required light irradiation parts can be reduced, and the device can be reduced in size.SELECTED DRAWING: Figure 4
申请公布号 JP2016225574(A) 申请公布日期 2016.12.28
申请号 JP20150113240 申请日期 2015.06.03
申请人 TOKYO ELECTRON LTD 发明人 HAYASHI MASAHITO;NOGUCHI KOHEI;IIZUKA KENJI;IIDA NARIAKI
分类号 H01L21/027;B05C11/00;B05C11/08;H01L21/304 主分类号 H01L21/027
代理机构 代理人
主权项
地址