| 摘要 |
PROBLEM TO BE SOLVED: To provide a nano-scaled dielectric material having a high dielectric constant and a high tunability. SOLUTION: A device comprises a substrate, a bottom electrode deposited on the substrate and selectively patterned thereon, a dielectric thin film coated on the bottom electrode and selectively patterned thereon, and a top electrode deposited on the dielectric thin film and patterned thereon. The dielectric thin film is evaporated at a unit lattice thickness. The dielectric thin film is formed by repeatedly depositing at least two dielectric materials having dielectric constants different from each other at least one time in a range of the single atomic layer thickness to 20 nm or by depositing at least two dielectric materials in a predetermined alignment adapted for a functional device, thereby forming one artificial lattice having an identical directional feature. COPYRIGHT: (C)2003,JPO
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