| 发明名称 |
Light scattering process chamber walls |
| 摘要 |
A semiconductor processing apparatus having a processing chamber defined by a plurality of walls and a substrate support to support a substrate within the processing chamber.
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| 申请公布号 |
US6720531(B1) |
申请公布日期 |
2004.04.13 |
| 申请号 |
US20020317267 |
申请日期 |
2002.12.11 |
| 申请人 |
ASM AMERICA, INC. |
发明人 |
JACOBSON PAUL T.;RAAIJMAKERS IVO |
| 分类号 |
C23C16/48;C30B25/10;C30B25/12;C30B31/14;F27B5/14;H01L21/00;(IPC1-7):F27B5/14 |
主分类号 |
C23C16/48 |
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