| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner in which throughput is enhanced while sustaining a desired exposure accuracy when a mask pattern is exposed on a photosensitive substrate while scanning. SOLUTION: The aligner illuminates a mask M having a patterned area PA with exposure light while moving the mask M and a photosensitive substrate synchronously thus transferring the pattern of te mask M onto the photosensitive substrate. The aligner has a blind for setting a plurality of illumination areas of exposure light for the mask M at a constant interval in the moving direction of the mask M. The blind sets the number of illumination areas and the interval thereof depending on the size of the patterned area PA of the mask M in the moving direction. COPYRIGHT: (C)2004,JPO |
