| 发明名称 |
PROCESS FOR DEVELOPING AGX LITH MATERIALS USING TWO REPLENISHERS H COMPENSATE FOR DEVELOPER EXHAUSTION |
| 摘要 |
<p>A process for developing photographic silver halide lith-materials in an automatic processing machine with a lith-developer, wherein two replenishers are used, one for compensation of the developer exhaustion resulting from aerial oxidation and a second replenisher serving for the compensation of exhaustion by development.</p> |
| 申请公布号 |
CA1070548(A) |
申请公布日期 |
1980.01.29 |
| 申请号 |
CA19760245288 |
申请日期 |
1976.02.09 |
| 申请人 |
AGFA-GEVAERT NAAMLOZE VENNOOTSCHAP |
发明人 |
CORLUY, HANS J.;SCHELFAUT, FRANCOIS L.;NYS, PIERRE H.;BORTELS, RAOUL J. |
| 分类号 |
G03C5/00;G03C5/29;G03C5/30;G03C5/31;(IPC1-7):03C5/26 |
主分类号 |
G03C5/00 |
| 代理机构 |
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