Vacuum vapour deposition unit - esp. for thin film deposition in microelectronics

摘要

Vacuum vapour deposition mixt. includes a vacuum chamber (1) contg. one or more evaporators (2), a substrate heater (6), a substrate holder (7) on a table (9), and a delivery chamber (11) for placing substrates on the holder. The novelty is that (i) the table (9) is fixed in the vacuum chamber (1); (ii) the delivery chamber (11) is mounted directly on the vacuum chamber (1); (iii) the substrate heater (6) is installed in a vacuum closure (4) which can be reciprocated relative to the subtrate holder (7) within the vacuum chamber (1); and (iv) each evaporator (2) is fitted on a reciprocable rod (3) allowing reciprocating motion relative to the substrate holder (7). USE/ADVANTAGE - The unit is esp. useful for vapour deposition of thin films in the electronics industry. It allows maximal proximity of the substrate heating and cleaning zones and the deposition zone without requiring devices for moving the substrate holder table and allows vapour deposition in the hot zone with temps. control, thus improving film quality and reproducibility.