发明名称 Optimized ECR plasma apparatus with varied microwave window thickness
摘要 The present invention describes a technique to control the radial profile of microwave power in an ECR plasma discharge. In order to provide for a uniform plasma density to a specimen, uniform energy absorption by the plasma is desired. By controlling the radial profile of the microwave power transmitted through the microwave window of a reactor, the profile of the transmitted energy to the plasma can be controlled in order to have uniform energy absorption by the plasma. An advantage of controlling the profile using the window transmission characteristics is that variations to the radial profile of microwave power can be made without changing the microwave coupler or reactor design.
申请公布号 US5466991(A) 申请公布日期 1995.11.14
申请号 US19940340140 申请日期 1994.11.15
申请人 SEMATECH, INC. 发明人 BERRY, LEE A.
分类号 H01J37/32;(IPC1-7):H01J7/24 主分类号 H01J37/32
代理机构 代理人
主权项
地址