| 摘要 |
PROBLEM TO BE SOLVED: To accurately and speedily measure resist patterns, etc., to which a semiconductor and liquid crystal are exposed and which are developed with a simple constitution. SOLUTION: The image measuring device which processes a measured image having a recognition mark for positioning composed of nearly orthogonal segments, a 1st measurement mark composed of segments nearly parallel to the segments of the recognition mark, and a 2nd measurement mark obtained by rotating the 1st measurement mark by a specific angle has a 1st image pickup means which has pixels arrayed in nearly the same direction with the segments of an image of the recognition mark and picks up the image of the recognition mark, a 2nd image pickup means which has pixels arrayed in nearly the same direction with the segments of an image of the 1st measurement mark and picks up the image of the 1st measurement mark, and a 3rd image pickup means which has pixels arrayed in the nearly the same direction with the segments of an image of the 2nd measurement mark and picks up the image of the 2nd measurement mark.
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