发明名称 |
Способ очистки октафторциклобутана, способ его получени и его применени |
摘要 |
A process for purifying octafluorocyclobutane according to the present invention is characterized by contacting a crude octafluorocyclobutane containing impurities with an impurity decomposing agent under elevated temperature and then with an adsorbent to substantially remove the impurities from the crude octafluorocyclobutane.According to the purification process or preparation process of octafluorocyclobutane of the present invention, the impurities such as fluorocarbon can be substantially removed and a high-purity octafluorocyclobutane can be easily obtained. The octafluorocyclobutane obtained by the purification process of the present invention is substantially free of impurities and therefore, can be used as an etching or cleaning gas for use in the production process of a semiconductor device or the like. |
申请公布号 |
RU2002127779(A) |
申请公布日期 |
2004.02.20 |
申请号 |
RU20020127779 |
申请日期 |
2002.01.11 |
申请人 |
ШОУВА ДЕНКО К.К. (JP) |
发明人 |
ХОРИБА Минако (JP);СУЗУКИ Яйсухиро (JP) |
分类号 |
C07C17/269;C07C17/389;C07C17/395;C07C23/06;H01L21/3065 |
主分类号 |
C07C17/269 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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