| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of more easily evaluating a liquid solution for forming an application film, which allows, without actually forming an application film, grasping the quality of the application film to be obtained, thereby allowing the evaluation of the liquid solution for forming the application film. SOLUTION: The method comprises steps of measuring a degree of clogging of a filter having an average diameter of holes of 0.01 to 0.4μm under the filtration of the liquid solution for forming the application film of a semiconductor and estimating, from the measured value, the quality of the application film of a semiconductor to be formed by the liquid solution. COPYRIGHT: (C)2005,JPO&NCIPI |
