发明名称 THIN FILM SURFACE ACOUSTIC WAVE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a thin film surface acoustic wave device capable of enhancing a resonator characteristic and a filter characteristic by reducing the parasitic capacitance caused between a substrate and a conductive film arranged to a lower layer of a piezoelectric thin film. SOLUTION: The thin film surface acoustic wave device 100 includes: the substrate 101; the piezoelectric thin film 103 arranged on the substrate 101; and electrodes 104ax, 104ay, and 105a formed to the surface of the piezoelectric thin film 103; and wire layers 104bx, 104by, 104cx, 104cy, and 105b conductively connected to the electrodes 104ax, 104ay, and 105a and is configured such that the distance between the substrate 101 and the wire layers 104bx, 104by, 104cx, 104cy, and 105b is greater than the distance between the substrate 101 and the electrodes 104ax, 104ay, and 105a. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005229513(A) 申请公布日期 2005.08.25
申请号 JP20040038467 申请日期 2004.02.16
申请人 SEIKO EPSON CORP 发明人 FURUHATA MAKOTO
分类号 H03H9/145;(IPC1-7):H03H9/145 主分类号 H03H9/145
代理机构 代理人
主权项
地址