发明名称 LARGE-SIZE SUBSTRATE CLEANING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a large-size substrate cleaning apparatus of a compact configuration which includes a short carriage path between each of cleaning and drying processes of a large-size glass substrate and does not require a wide installation space in the cleaning performed after processing of the large-size glass substrate having a lateral side exceeding one meter. SOLUTION: The large-size substrate cleaning apparatus is composed of a cleaning part 30 comprising: spray nozzles 31 for chemicals; one or more pairs of contact type cleaning tools 32, 33 arranged on the upper part of the nozzles such that each pair of tools includes a pair of non-contact type cleaning tool on the above side while facing each other; one pair of shower nozzles 34 arranged on the uppermost part of the pair of contact type cleaning tool 33 which is arranged on the upper part of the nozzles such that each pair of tools includes a pair of non-contact type cleaning tool on the above side while facing each other; and a pair of jet nozzles 35 which are arranged on the upper part of the nozzles while facing each other, a drying part 40 provided with a pair of air knives 41 which are arranged on the upper side of the cleaning part 30 while facing each other, a substrate-retaining conveying fixture 50 which retains a large-size substrate 90 while allowing the substrate to stand erect and a charge/delivery part 60 which is arranged on the lower side of the cleaning part 30. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009195777(A) 申请公布日期 2009.09.03
申请号 JP20080037598 申请日期 2008.02.19
申请人 SHIMADA PHYS & CHEM IND CO LTD 发明人 TACHIHABA YOSHITO;TAKISHITA KAZUHIRO;SHIMADA KIYOSHI
分类号 B08B7/04;B08B1/04;B08B3/02;B08B3/08;B08B3/12;B65G49/04;B65G49/06;G02F1/1333;H01L21/683 主分类号 B08B7/04
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