| 摘要 |
PURPOSE:To obviate relative positional shifting between a mask and a wafer and positional shifting with a light source for exposing by detecting the positions of the mask and the wafer with respect to a base plate by respectively separate laser interferometers and positioning the mask and the wafer. CONSTITUTION:A three-dimensional moving device for a wafer 6 is constituted of an X stage 2, a Y stage 3, THETA stage 4 and a wafer holder 5 and a three-dimensional moving device for a mask 14 is constituted of an XY stage 10, THETA stage 11 and a mask holder 13. The two-dimensional position of the wafer 6 can be detected by reflection mirrors 7, 7' provided to the Y stage 3 and two laser interferometers 30, 30', and the two-dimensional position of the mask 14 can be detected by reflection mirrors 15, 15' provided to the XY stage 10 and laser interferometers 40, 40'. An optical microscope 23 for the two-dimensional positioning of the mask 14 and the wafer 6 and setting a proximity gap is provided. |
