CHEMICAL MECHANICAL POLISHING SYSTEM

摘要

The present invention relates to a chemical mechanical polishing system comprising: a memory for storing control data for the components of a chemical mechanical polishing device; and the chemical mechanical polishing device controlled by calling control data from used component information from the memory. The chemical mechanical polishing system can stably maintain the quality of the wafer polished by the chemical mechanical polishing device all the time to obtain reliable polishing quality, by storing the control data for the components of the chemical mechanical polishing device in the memory in advance, and controlling the chemical mechanical polishing device by calling the control data stored in the memory in accordance with the state of the components or a usage period.