发明名称 METHOD AND APPARATUS FOR FORMING A GRAPHENE PATTERN USING A DELAMINATION TECHNIQUE
摘要 The present invention relates to a graphene pattem forming method using a delamination technique employing ap01lymer stamp. The technique is adequate for forming a graphene pattem having a an arbitrary target pattem. According to the present invention, a portion of a graphene layer formed on a substrate is physically and selectively delaminated using the polymer stamp to simply and easily form a desired graphene pattem having a uniform line width on the substrate. Also, a porion of the graphene layer formed on the substrate is physically and selectively delaminated in a roll-to-roll manner using a rotating body stamp or by using a stamp having a large area to simply and easily form a desired graphene pattem having a uniform line width on the a substrate having a large area.
申请公布号 EP2709141(A4) 申请公布日期 2016.12.21
申请号 EP20120786200 申请日期 2012.05.10
申请人 Korea Research Institute of Chemical Technology 发明人 LEE, Sun Sook;JUNG, Daesung;KIM, Han Sun;AN, Ki-Seok;CHUNG, Taek-Mo;KIM, Chang Gyoun;LEE, Young Kuk
分类号 H01L21/027 主分类号 H01L21/027
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