发明名称 半導体ウエハマッピング方法及び半導体ウエハのレーザ加工方法
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor wafer mapping method for smoothly implementing dicing by highly accurately measuring warpage or swell around a semiconductor wafer beforehand as a preparation step of cutting a semiconductor wafer and manufacturing a semiconductor chip in a semiconductor manufacturing device.SOLUTION: The semiconductor wafer mapping method in a laser processing machine for manufacturing a semiconductor chip by longitudinally and laterally cutting a semiconductor wafer S formed by longitudinally and laterally aligning predetermined circuits includes: sucking and holding the semiconductor wafer S on a movable table 12; irradiating a surface of the semiconductor wafer S with laser light; detecting reflection light reflected on the surface of the semiconductor wafer S to measure a surface height of the semiconductor wafer S; moving the movable table 12 in X and Y directions; and forming a trajectory line 19 of a measurement position on the surface of the semiconductor wafer S along an outer circumference S1 of the semiconductor wafer S to acquire a data map in the surface height of the semiconductor wafer S.
申请公布号 JP6046535(B2) 申请公布日期 2016.12.14
申请号 JP20130067324 申请日期 2013.03.27
申请人 株式会社東京精密 发明人 野口 俊;千葉 清隆
分类号 H01L21/301;B23K26/00;B23K26/40 主分类号 H01L21/301
代理机构 代理人
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