| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus capable of easily recovering coating film debris and of being easily maintained.SOLUTION: A substrate W is subjected to stripping treatment by positioning a lifter 9 at a treatment position in a state where a capturing component 25 is being positioned at a recovery position. As a result, a photoresist coating film stripped from the substrate W drifts within a treatment tank 3 and is then discharged toward the side of an overflow tank 5 via a liquid flow of a stripper. At this time, the capturing component 25 captures debris of the photoresist coating film thus discharged, and therefore, the debris of the coating film captured by the capturing component 25 is discarded following the mobilization of the capturing component 25 to a discarding position. It therefore becomes possible to easily recover the debris of the photoresist coating film and to facilitate maintenance. |
