发明名称 PATTERN FORMING METHOD AND MANUFACTURE OF IMAGE FORMING DEVICE USING THE METHOD
摘要 <p>PROBLEM TO BE SOLVED: To efficiently eliminate a short-circuit fault. SOLUTION: This pattern forming method includes a pattern forming process for forming, a cyclic arrangement of unit pattern with a conductor having electrically separated pattern portion 3 on a substrate and a short-circuit eliminating process for eliminating the short-circuiting state of a short-circuited substance out of the formed patterns of the pattern portion 3. The short- circuiting state is eliminated by applying a removal pattern 21 to the unit pattern which is disposed one or a plurality of standardized removal patterns 21 on the unit pattern in a fixed positional relation and a removal means is provided for removing, a defective part of the unit pattern overlapping with the removal pattern 21 by a physical working method.</p>
申请公布号 JP2000182545(A) 申请公布日期 2000.06.30
申请号 JP19980353370 申请日期 1998.12.11
申请人 CANON INC 发明人 UDA YOSHIKI
分类号 H01J9/50;B23K26/00;G03F7/40;H01J9/02;H01J31/12;(IPC1-7):H01J31/12 主分类号 H01J9/50
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