| 摘要 |
A method for manufacturing a micromechanical timepiece part starting from a silicon-based substrate, including, providing a silicon-based substrate, forming pores on the surface of at least one part of a surface of the silicon-based substrate of a depth of at least 10 μm, preferably of at least 50 μm, and more preferably of at least 100 μm, the pores being designed in order to open out at the external surface of the micromechanical timepiece part. A micromechanical timepiece part including a silicon-based substrate which has, on the surface of at least one part of a surface of the silicon-based substrate, pores of a depth of at least 10 μm, preferably of at least 50 μm, and more preferably of at least 100 μm, the pores being designed in order to open out at the external surface of the micromechanical timepiece part. |
| 主权项 |
1. A method for manufacturing a micromechanical timepiece part starting from a silicon-based substrate, comprising, in order, the steps of:
a) providing a silicon-based substrate, b) forming pores on the surface of at least one part of a surface of said silicon-based substrate of a depth of at least 10 μm, said pores being designed in order to open out at the external surface of the micromechanical timepiece part. |
