发明名称 Probe device having cleaning mechanism for cleaning connection conductor
摘要 A probe device includes an electrode plate arranged above a mounting table for mounting thereon a semiconductor wafer and electrically connected to a tester, a connection conductor arranged at a side of the mounting table and electrically connected to a mounting table electrode formed on a mounting surface of the mounting table, and a cleaning mechanism including a polishing unit for polishing a contact portion of the connection conductor, a brush cleaning unit for performing a brush-cleaning of the contact portion, and a contact resistance measuring unit for measuring a contact resistance of the contact portion. The mounting table electrode is in contact with a backside electrode of a semiconductor device of the semiconductor wafer. When the connection conductor is connected to the electrode plate, a backside electrode formed on a backside of the semiconductor device and the tester are electrically connected to each other.
申请公布号 US9638719(B2) 申请公布日期 2017.05.02
申请号 US201414781003 申请日期 2014.03.18
申请人 TOKYO ELECTRON LIMITED 发明人 Shinohara Eiichi;Nagasaka Munetoshi;Kato Yoshiyasu
分类号 G01R3/00;G01R31/28;G01R1/073 主分类号 G01R3/00
代理机构 代理人
主权项 1. A probe device which is electrically connected to a semiconductor device formed on a semiconductor wafer and performs an electrical test of the semiconductor device by a tester, the probe device comprising: a mounting table configured to mount thereon the semiconductor wafer; a mounting table electrode formed on a mounting surface of the mounting table on which the semiconductor wafer is mounted, the mounting table electrode being in contact with a backside electrode formed on a backside of the semiconductor device; a probe card arranged above the mounting table, the prove card having a plurality of probes electrically connected to the tester; a driving mechanism configured to drive the mounting table to make the probes contact with electrodes of the semiconductor device of the semiconductor wafer mounted on the mounting table; an electrode plate arranged above the mounting table and electrically connected to the tester; a connection conductor arranged at a side of the mounting table and electrically connected to the mounting table electrode, the connection conductor being connectable to the electrode plate, wherein when the connection conductor is connected to the electrode plate, the backside electrode and the tester are electrically connected to each other; and a cleaning mechanism including a polishing unit configured to polish a contact portion of the connection conductor with the electrode plate, a brush cleaning unit configured to perform a brush-cleaning of the contact portion, and a contact resistance measuring unit configured to measure a contact resistance of the contact portion.
地址 Tokyo JP