Tuning a parameter associated with plasma impedance

摘要

Systems and methods for tuning a parameter associated with plasma impedance are described. One of the methods includes receiving information to determine a variable. The information is measured at a transmission line and is measured when the parameter has a first value. The transmission line is used to provide power to a plasma chamber. The method further includes determining whether the variable is at a local minima and providing the first value to tune the impedance matching circuit upon determining that the variable is at the local minima. The method includes changing the first value to a second value of the parameter upon determining that the variable is not at the local minima and determining whether the variable is at a local minima when the parameter has the second value.

主权项

1. A system for tuning a parameter associated with plasma impedance, comprising:
a radio frequency (RF) generator configured to generate an RF signal; a line connected to the RF generator; an impedance matching circuit connected to the line; and one or more processors coupled to the RF generator, the one or more processors configured to:
receive information to determine a variable, the information measured at the line, the information measured when the parameter has a first value;determine whether the variable is at a local minima when the parameter has the first value;provide the first value to generate the RF signal upon determining that the variable is at the local minima; andchange the first value to a second value of the parameter upon determining that the variable is not at the local minima.