发明名称 Plasma ion source for use with a focused ion beam column with selectable ions
摘要 An inductively coupled plasma source having multiple gases in the plasma chamber provides multiple ion species to a focusing column. A mass filter allows for selection of a specific ion species and rapid changing from one species to another.
申请公布号 US9627169(B2) 申请公布日期 2017.04.18
申请号 US201514804148 申请日期 2015.07.20
申请人 FEI Company 发明人 Graupera Anthony;Otis Charles
分类号 H01J37/05;H01J37/317;H01J37/08 主分类号 H01J37/05
代理机构 Scheinberg & Associates, P.C. 代理人 Scheinberg & Associates, P.C. ;Scheinberg Michael O.
主权项 1. A charged particle beam system, comprising: a plasma ion source; one or more gas sources for providing multiple gases to the plasma ion source to produce multiple ion species simultaneously from the plasma ion source, the gas sources including a source of at least one of following gases: helium, xenon, argon, hydrogen, neon, and oxygen; a mass filter to select an ion species from the multiple ion species produced by the plasma ion source; and focusing optics to produce a focused beam of the selected ion species at a target, the beam having a submicron diameter at the target.
地址 Hillsboro OR US