发明名称 |
Plasma ion source for use with a focused ion beam column with selectable ions |
摘要 |
An inductively coupled plasma source having multiple gases in the plasma chamber provides multiple ion species to a focusing column. A mass filter allows for selection of a specific ion species and rapid changing from one species to another. |
申请公布号 |
US9627169(B2) |
申请公布日期 |
2017.04.18 |
申请号 |
US201514804148 |
申请日期 |
2015.07.20 |
申请人 |
FEI Company |
发明人 |
Graupera Anthony;Otis Charles |
分类号 |
H01J37/05;H01J37/317;H01J37/08 |
主分类号 |
H01J37/05 |
代理机构 |
Scheinberg & Associates, P.C. |
代理人 |
Scheinberg & Associates, P.C. ;Scheinberg Michael O. |
主权项 |
1. A charged particle beam system, comprising:
a plasma ion source; one or more gas sources for providing multiple gases to the plasma ion source to produce multiple ion species simultaneously from the plasma ion source, the gas sources including a source of at least one of following gases: helium, xenon, argon, hydrogen, neon, and oxygen; a mass filter to select an ion species from the multiple ion species produced by the plasma ion source; and focusing optics to produce a focused beam of the selected ion species at a target, the beam having a submicron diameter at the target. |
地址 |
Hillsboro OR US |