发明名称 |
Semiconductor device with current sensor |
摘要 |
A semiconductor device includes a semiconductor body. The semiconductor body includes a load transistor part and a sensor transistor part. A first source region of the load transistor part and a second source region of the sensor transistor part are electrically separated from each other. A common gate electrode in a common gate trench extends into the semiconductor body from a first surface. A first part of the common gate trench is in the load transistor part, and a second part of the common gate trench is in the sensor transistor part. A field electrode in a field electrode trench extends into the semiconductor body from the first surface. A maximum dimension of the field electrode trench parallel to the first surface is smaller than a depth of the field electrode trench. |
申请公布号 |
US9614044(B2) |
申请公布日期 |
2017.04.04 |
申请号 |
US201514853164 |
申请日期 |
2015.09.14 |
申请人 |
Infineon Technologies Austria AG |
发明人 |
Hutzler Michael;Roesch Maximilian |
分类号 |
H01L29/772;H01L29/739;H01L29/66;H01L29/40;H01L29/78;H01L29/06;H01L27/088 |
主分类号 |
H01L29/772 |
代理机构 |
Murphy, Bilak & Homiller, PLLC |
代理人 |
Murphy, Bilak & Homiller, PLLC |
主权项 |
1. A semiconductor device, comprising:
a semiconductor body comprising a load transistor part and a sensor transistor part; a first source region of the load transistor part and a second source region of the sensor transistor part, the first and second source regions being electrically separated from each other; a common gate electrode in a common gate trench extending into the semiconductor body from a first surface, the gate trench extending through the load transistor part and the sensor transistor part, wherein a whole cross-section of the common gate trench extends through both the load transistor part and the sensor transistor part; and a field electrode in a field electrode trench extending into the semiconductor body from the first surface, wherein a maximum dimension of the field electrode trench parallel to the first surface is smaller than a depth of the field electrode trench. |
地址 |
Villach AT |