发明名称 VALVUE AND FLUID CONTROL DEVICE
摘要 A fluid control device includes a piezoelectric pump, a suction unit, and a valve. The piezoelectric pump has a suction hole for a gas and a discharge hole for the gas. The suction unit includes a container, a suction port, and a connection hole. The valve includes a first ventilation hole, a second ventilation hole, a third ventilation hole, a first valve housing, a second valve housing, and a diaphragm. The first ventilation hole of the valve is connected to the connection hole of the suction unit. The second ventilation hole of the valve is connected to the suction hole of the piezoelectric pump. The third ventilation hole of the valve is opened under atmospheric pressure. The diaphragm is clamped between the first valve housing and the second valve housing and forms a first region and a second region.
申请公布号 US2017072117(A1) 申请公布日期 2017.03.16
申请号 US201615345658 申请日期 2016.11.08
申请人 Murata Manufacturing Co., Ltd. 发明人 KURIHARA Kiyoshi;TAKEUCHI Susumu
分类号 A61M1/00;F16K7/17;A61M1/06 主分类号 A61M1/00
代理机构 代理人
主权项 1. A valve comprising: a valve housing comprising a first ventilation hole, a second ventilation hole, and a third ventilation hole; and a diaphragm dividing a region in the valve housing into a first region and a second region, wherein the first region is in communication with the first ventilation hole, and the second region is in communication with the second ventilation hole, wherein the diaphragm is fixed to the valve housing such that the diaphragm causes the first ventilation hole and the second ventilation hole to communicate with each other and interrupts a communication between the first ventilation hole and the third ventilation hole and a communication between the second ventilation hole and the third ventilation hole when a pressure in the first region is higher than a pressure in the second region and such that the diaphragm causes the first ventilation hole and the third ventilation hole to communicate with each other when the pressure in the first region is lower than the pressure in the second region.
地址 Kyoto JP