| 发明名称 |
TECHNIQUES AND APPARATUS FOR MANIPULATING AN ION BEAM |
| 摘要 |
A method may include: generating an ion beam from an ion source, the ion beam having an initial direction of propagation; deflecting the ion beam at an initial angle of inclination with respect to the initial direction of propagation; passing the ion beam through an aperture in a magnetic assembly; and generating in the aperture, a quadrupole field extending along a first direction perpendicular to the initial direction of propagation of the ion beam, and a dipole field extending along a second direction perpendicular to the first direction and the initial direction of propagation. |
| 申请公布号 |
US2017076908(A1) |
申请公布日期 |
2017.03.16 |
| 申请号 |
US201514849813 |
申请日期 |
2015.09.10 |
| 申请人 |
Varian Semiconductor Equipment Associates, Inc. |
发明人 |
Buff James S.;Benveniste Victor;Sinclair Frank |
| 分类号 |
H01J37/147;H01J37/14;H01J37/317 |
主分类号 |
H01J37/147 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method, comprising:
generating an ion beam from an ion source, the ion beam having an initial direction of propagation; deflecting the ion beam at an initial angle of inclination with respect to the initial direction of propagation; passing the ion beam through an aperture in a magnetic assembly; and generating in the aperture, a quadrupole field extending along a first direction perpendicular to the initial direction of propagation of the ion beam, and a dipole field extending along a second direction perpendicular to the first direction and the initial direction of propagation. |
| 地址 |
Gloucester MA US |
