发明名称 イオンビーム装置
摘要 The charged particle beam microscope is configured of: a gas field ionization ion source (1); a focusing lens (5) which accelerates and focuses ions that have been discharged from the ion source; a movable first aperture (6) which limits the ion beam that has passed through the focusing lens; a first deflector (35) which scans or aligns the ion beam that has passed through the first aperture; a second deflector (7) which deflects the ion beam that has passed through the first aperture; a second aperture (36) which limits the ion beam that has passed through the first aperture; an objective lens (8) which focuses, on a sample, the ion beam that has passed through the first aperture; and a means for measuring the signal, which is substantially proportional to the current of the ion beam that has passed through the second aperture.
申请公布号 JP6093752(B2) 申请公布日期 2017.03.08
申请号 JP20140263843 申请日期 2014.12.26
申请人 株式会社日立ハイテクノロジーズ 发明人 志知 広康;松原 信一;荒井 紀明;石谷 亨;小瀬 洋一;川浪 義実
分类号 H01J37/28;H01J27/26;H01J37/09;H01J37/147;H01J37/16;H01J37/244 主分类号 H01J37/28
代理机构 代理人
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