发明名称 Compound gated semiconductor device having semiconductor field plate
摘要 A transistor includes a source, a drain spaced apart from the source, and a heterostructure body having a two-dimensional charge carrier gas channel for connecting the source and the drain. The transistor further includes a semiconductor field plate disposed between the source and the drain. The semiconductor field plate is configured to at least partly counterbalance charges in the drain when the transistor is in an off state in which the channel is interrupted and a blocking voltage is applied to the drain. The counterbalance charge provided by the semiconductor field plate is evenly distributed over a plane or volume of the semiconductor field plate. Various semiconductor field plate configurations and corresponding manufacturing methods are described herein.
申请公布号 US9590087(B2) 申请公布日期 2017.03.07
申请号 US201414540535 申请日期 2014.11.13
申请人 Infineon Technologies Austria AG 发明人 Werner Wolfgang;Kahlmann Frank;Hirler Franz
分类号 H01L29/778;H01L29/40;H01L29/66;H01L29/43;H01L29/06;H01L29/205;H01L29/423;H01L29/08;H01L29/20 主分类号 H01L29/778
代理机构 Murphy, Bilak & Homiller, PLLC 代理人 Murphy, Bilak & Homiller, PLLC
主权项 1. A transistor, comprising: a source; a drain spaced apart from the source; a heterostructure body comprising a first III-nitride semiconductor, a second III-nitride semiconductor on the first III-nitride semiconductor and a third III-nitride semiconductor on the second III-nitride semiconductor, the second III-nitride semiconductor having a different band gap than the first III-nitride semiconductor such that a two-dimensional charge carrier gas channel arises along an interface between the first and second III-nitride semiconductors for connecting the source and the drain; and a semiconductor field plate comprising a doped region of the third III-nitride semiconductor that is p-doped.
地址 Villach AT