发明名称 MRAM with magnetic material surrounding contact plug
摘要 This technology provides an electronic device and a method of fabricating the same. An electronic device in accordance with an implementation of this document includes semiconductor memory, and the semiconductor memory includes a contact plug which is disposed over a substrate and extends in a vertical direction; a variable resistance element which is coupled to the contact plug and includes a first magnetic layer having a variable magnetization direction, a second magnetic layer having a pinned magnetization direction, and a tunnel barrier layer interposed between the first magnetic layer and the second magnetic layer; and a third magnetic layer which surrounds a sidewall of the contact plug and has a same magnetization direction as the second magnetic layer.
申请公布号 US9589617(B2) 申请公布日期 2017.03.07
申请号 US201615144738 申请日期 2016.05.02
申请人 SK hynix Inc. 发明人 Park Ji-Ho
分类号 G11C11/16;G06F12/08;G06F13/40 主分类号 G11C11/16
代理机构 Perkins Coie LLP 代理人 Perkins Coie LLP
主权项 1. An electronic device comprising semiconductor memory, wherein the semiconductor memory includes: a substrate; a dielectric layer formed over the substrate; an array of contact plugs formed in the dielectric layer over a substrate, each contact plug being configured to extend in the dielectric layer along a direction perpendicular to the substrate; an array of variable resistance elements formed over the contact plugs, respectively, each variable resistant element being coupled to a corresponding contact plug and including a first magnetic layer having a variable magnetization direction, a second magnetic layer having a pinned magnetization direction, and a tunnel barrier layer interposed between the first magnetic layer and the second magnetic layer; and an array of third magnetic layer structures formed in the dielectric layer and corresponding to the array of contact plugs, respectively, so that one third magnetic layer structure is formed around a corresponding contact plug and is located outside of a respective variable resistance element coupled to the corresponding contact plug as a separate structure from the respective variable resistance element, wherein each third magnetic layer structure produces a magnetic field in the first magnetic layer of the respective that offsets an influence of a bias magnetic field in the first magnetic layer that is generated by the second magnetic layer.
地址 Icheon-Si KR