发明名称 GAS INJECTION SYSTEM FOR ION BEAM DEVICE
摘要 A gas injection system for an ion beam device, the gas injection system including an extraction plate, an extraction aperture formed in the extraction plate for allowing passage of an ion beam, a first gas distributor removably fastened to the extraction plate on a first side of the extraction aperture, the first gas distributor having a gas orifice formed therein, a second gas distributor removably fastened to the extraction plate on a second side of the extraction aperture opposite the first side, the second gas distributor having a gas orifice formed therein, a first gas conduit extending through the extraction plate between the first gas distributor and a gas manifold mounted to the extraction plate, and a second gas conduit extending through the extraction plate between the second gas distributor the gas manifold, and a residue removal gas source connected to the gas manifold.
申请公布号 US2017062185(A1) 申请公布日期 2017.03.02
申请号 US201514840531 申请日期 2015.08.31
申请人 Varian Semiconductor Equipment Associates, Inc. 发明人 Wallace Jay;Allen Ernest;Hertel Richard;Daniels Kevin;Gilchrist Glen
分类号 H01J37/32 主分类号 H01J37/32
代理机构 代理人
主权项 1. A gas injection system for an ion beam device, the gas injection system comprising: an extraction plate having an aperture for allowing passage of an ion beam through the extraction plate; and a gas distributor coupled to the extraction plate, the gas distributor having a gas orifice formed therein.
地址 Gloucester MA US
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