| 摘要 |
PROBLEM TO BE SOLVED: To provide a monitoring device and a monitoring method for simply knowing the degree of wear of a member in the plasma chamber of a microwave ion source.SOLUTION: A monitoring device of a microwave ion source 10 includes a microwave ion source 10 including a plasma chamber 11 having an ion extraction opening 17, and a plasma chamber monitor 50 of the plasma chamber 11 disposed on the outside of the plasma chamber 11 in order to monitor the inside of the plasma chamber 11 through the ion extraction opening 17. The plasma chamber monitor 50 may includes a non-contact displacement sensor 52 for measuring the displacement amount of a measurement position 21 in an inner wall member for protecting a microwave introduction window 16 in non-contact. |
